Subject: IEEE April Seminar: NanoImprint - Patterning Storage for Tablets/Netbooks and NanoMedical Applications

 

The IEEE SFBA Nanotechnology council invites you to its Tuesday April 20 noon time seminar. See the details below.
Also, plan ahead for the 6th annual Symposium - now two days May 18 & 19. Get in on early bird rates. RSVP and registration links for both at www.ieee.org/nano.
 

Subject:

NanoImprint - Patterning Storage for Tablets/Netbooks and NanoMedical Applications

 

Speaker:

S.V. Sreenivasan, Founder and Chief Technical Officer of Molecular Imprints.

 

Date: Tuesday, April 20, 2010

Time: Registration & light lunch 11:30am . Presentation & Q/A 12:00 to 1pm

 

Location: National Semiconductor Bldg E-1 CMA Room. 2900 Semiconductor Drive , Santa Clara , CA http://www.google.com/search?hl=en&q=2900+Semiconductor+Drive.+santa+clara %2C+ca&btnG=Google+Search

Cost: IEEE Members and Students $5. Non-Members $10

 

Please RSVP at our web site: www.ieee.org/nano                                

 

Talk Abstract:

 

NanoImprint technology is entering its third generation of equipment that is targeted at high volume production. The equipment, based on the evolution of the J-FIL technology, can now produce sufficient resolution, overlay and field size, to provide the capability for patterning the 2.5" and 3.5" high capacity HDD s needed for the new media based tablet PC, eReaders and netbooks. To accompany this printing capability, new NanoMastering technology for creating cost effective working material for the imprinting has been developed. The talk will review how the J-FIL technology works, the challenges and solutions needed for ultra high density (Tb/in2) HDD media and the applicability of the same patterning technology in a mixed 193i CMOS lithographic/NanoImprint application. The technology behind the image resolution and patterning method will also review the extendability to the nanomedicine and solar applications.

 

Speaker Biography:

 

S.V. Sreenivasan is a founder and Chief Technical Officer of Molecular Imprints. He is one of the inventors of Jet and Flash(tm) Imprint Lithography (J-FIL(tm)) technology. S.V. is a Professor of Mechanical Engineering and the Thornton Centennial Fellow in Engineering at the University of Texas at Austin. He earned his Ph.D. in mechanical engineering from The Ohio State University. He specializes in the area of high throughput nano-manufacturing processes as applied to terabit density magnetic storage, nanoelectronics, and photonic devices. He has led interdisciplinary projects involving development of tools, masks, materials, and processes for successful deployment of J-FIL technology. His interests also include adaptation of J-FIL technology for emerging applications in the biomedical and energy sectors. S.V. has published over 100 technical articles and holds over 60 U.S. patents in the area of nanomanufacturing. S.V. has received several awards including being named a Technology Pioneer by the World Economic Forum in Davos in 2005, University of Texas Chancellors' Award for Entrepreneurship in 2007, and the American Society of Mechanical Engineers Leonardo Da Vinci Award in 2009.

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